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1. Identity statement
Reference TypeJournal Article
Sitemtc-m21c.sid.inpe.br
Holder Codeisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identifier8JMKD3MGP3W34R/3RPNPN2
Repositorysid.inpe.br/mtc-m21c/2018/09.06.16.12   (restricted access)
Last Update2018:09.06.16.12.26 (UTC) simone
Metadata Repositorysid.inpe.br/mtc-m21c/2018/09.06.16.12.26
Metadata Last Update2019:01.14.17.06.34 (UTC) administrator
DOI10.1063/1.5040588
ISSN2158-3226
Citation KeyUedaSouzMariPich:2018:OvShOv
TitleOvercoming sheaths overlapping in a small diameter metallic tube with one end closed and using a high density plasma from a high power pulsed hollow cathode discharge
Year2018
MonthAug.
Access Date2024, May 19
Type of Workjournal article
Secondary TypePRE PI
Number of Files1
Size3538 KiB
2. Context
Author1 Ueda, Mário
2 Souza, G. B. de
3 Mariano, Samantha de Fátima Magalhães
4 Pichon, L.
Resume Identifier1 8JMKD3MGP5W/3C9JHSB
Group1 LABAP-COCTE-INPE-MCTIC-GOV-BR
2
3 CMS-ETES-SESPG-INPE-MCTIC-GOV-BR
Affiliation1 Instituto Nacional de Pesquisas Espaciais (INPE)
2 Universidade Estadual de Ponta Grossa
3 Instituto Nacional de Pesquisas Espaciais (INPE)
4 Institut Pprime - CNRS -Universite de Poitiers-ENSM
Author e-Mail Address1 mario.ueda@inpe.br
JournalAIP Advances
Volume8
Number1
Pagese085103
Secondary MarkB4_MEDICINA_II B5_MATERIAIS B5_FARMÁCIA B5_ENGENHARIAS_IV C_INTERDISCIPLINAR C_ASTRONOMIA_/_FÍSICA
History (UTC)2018-09-06 16:13:13 :: simone -> administrator :: 2018
2019-01-04 16:57:10 :: administrator -> simone :: 2018
2019-01-04 17:54:31 :: simone -> administrator :: 2018
2019-01-14 17:06:34 :: administrator -> simone :: 2018
3. Content and structure
Is the master or a copy?is the master
Content Stagecompleted
Transferable1
Content TypeExternal Contribution
Version Typepublisher
AbstractHigh voltage sheaths are formed when plasmas are produced by application of high negative voltage pulses to conductive supports or components, as in Plasma Immersion Ion Implantation (PIII) treatments of materials surfaces. For parts with concave shape, as inside metal tubes, these sheaths behave quite differently according to the tube configuration and size, as well as, PIII treatment pressure of operation and pulsing parameters. In this work, an SS304 tube of 1.1 cm internal diameter and 20 cm length was pulsed typically at -0.5 to -2.6 kV, 20 µs pulse length, 500 Hz repetition rate, nitrogen pressure of 5x10-2 mbar and with one side closed configuration. Different currents (between 10 and 30 A) were used to produce plasmas with sheaths that overlapped or not, depending on the currents used. To study these sheath behaviors, a simple plasma diagnostic technique based on a bi-dimensional mapping of the deposition of sputtered materials and by etching via the plasma on a Si wafer target surface, both coming out from the tube, was used. This mapping showed clearly the border line situation between overlapping and non-overlapping sheaths in that small tube which allowed to estimate the plasma density to be around 1011 cm-3 at such a sheath condition, as previously anticipated by Sheridan. Above that border condition, nitrogen PIII was successfully obtained in such a small tube of SS304, producing TiN and Ti2N in samples of Ti6Al4V placed inside the tube, when temperatures higher than 800◦C were reached there. Below the border, no significant uptake of nitrogen was possible. Using this type of experimental set-up, it is now possible to explore different hollow cathode behaviors, efficient or high temperature (above 800◦C) PIII conditions and also new utilizations of the plasma ejected from the tube.
AreaFISPLASMA
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4. Conditions of access and use
Languageen
Target Fileueda_overcoming.pdf
User Groupsimone
Reader Groupadministrator
simone
Visibilityshown
Read Permissiondeny from all and allow from 150.163
Update Permissionnot transferred
5. Allied materials
Next Higher Units8JMKD3MGPCW/3ET2RFS
8JMKD3MGPCW/3F358GL
Citing Item Listsid.inpe.br/bibdigital/2013/09.25.21.49 3
sid.inpe.br/bibdigital/2013/10.14.21.39 3
sid.inpe.br/mtc-m21/2012/07.13.14.56.06 1
DisseminationWEBSCI; PORTALCAPES; COMPENDEX.
Host Collectionurlib.net/www/2017/11.22.19.04
6. Notes
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